Sichen Qin, Yifei Ma, Qian Wang, 等. Numerical Calculation Model for Obtaining Parameters of Insulation Materials in HVDC-GIL Subjected to Transition Field[J]. 中国电机工程学会电力与能源系统学报(英文), 2025,11(3):1416-1422.
Sichen Qin, Yifei Ma, Qian Wang, et al. Numerical Calculation Model for Obtaining Parameters of Insulation Materials in HVDC-GIL Subjected to Transition Field[J]. CSEE Journal of Power and Energy Systems, 2025, 11(3): 1416-1422.
Sichen Qin, Yifei Ma, Qian Wang, 等. Numerical Calculation Model for Obtaining Parameters of Insulation Materials in HVDC-GIL Subjected to Transition Field[J]. 中国电机工程学会电力与能源系统学报(英文), 2025,11(3):1416-1422.DOI: 10.17775/CSEEJPES.2021.03640.
Sichen Qin, Yifei Ma, Qian Wang, et al. Numerical Calculation Model for Obtaining Parameters of Insulation Materials in HVDC-GIL Subjected to Transition Field[J]. CSEE Journal of Power and Energy Systems, 2025, 11(3): 1416-1422.DOI: 10.17775/CSEEJPES.2021.03640.
Numerical Calculation Model for Obtaining Parameters of Insulation Materials in HVDC-GIL Subjected to Transition Field
摘要
Abstract
In this paper
we compare the differences in the charge accumulation for two different models about conductivity: one in which the conductivity value of the spacer is invariant with time (steady-state conductivity
Model I) and one in which the conductivity value can vary dynamically with time (dynamic conductivity
Model II). The time for the potential distribution to reach a stable state is 8078 s in Model I and 7932 s in Model II. After the charge accumulation reaches saturation
the charges migrate to the middle of the spacer under the applied electric field. Maximum tangential field strength is
${2.56} \times {10}^{6}\ \mathrm{V}/\mathrm{m}$
in Model I and
${2.84} \times {5}\ \mathrm{C}/\mathrm{m}^{3}$
which is much smaller than the charge density in the spacer. The mechanism underlying the charge accumulation phenomenon is the differences in the conductivity value distribution caused by a time-varying temperature gradient field. This paper can provide a more precise theoretical basis for the selection and modification of HVDC-GIL spacer.