Surface flashover is a gas–solid interface insulation failure that significantly jeopardises the secure operation of advanced electronic

electrical

and spacecraft applications. Despite the widespread application of numerous material modification and structure optimisation technologies aimed at enhancing surface flashover performance

the influence mechanisms of the present technologies have yet to be systematically discussed and summarised. This review aims to introduce various material modification technologies while demonstrating their influence mechanisms on flashover performances by establishing relationships among ‘microscopic structure-mesoscopic charge transport-macroscopic insulation failure’. Moreover

it elucidates the effects of chemical structure on surface trap parameters and surface charge transport concerning flashover performance. The review categorises and presents structure optimisation technologies that govern electric field distribution. All identified technologies highlight that achieving a uniform tangential electric field and reducing the normal electric field can effectively enhance flashover performance. Finally

this review proposes recommendations encompassing mathematical

chemical

evaluation

and manufacturing technologies. This systematic summary of current technologies

their influence mechanisms

and associated advantages and disadvantages in improving surface insulation performance is anticipated to be a pivotal component in flashover and future dielectric theory.