Epoxy resin

as an insulating material in gas insulated devices

tends to accumulate surface charge under high DC voltage

resulting in surface flashover. In order to suppress the surface charge accumulation on epoxy resin

non-thermal plasmas generated by gliding arc discharge driven by high-frequency high-voltage power supply are used to deposit SiO

2

-like film on the surface of epoxy resin. The reaction precursor is tetraethyl orthosilicate（TEOS）. The properties of the sample before and after deposition are analyzed with Fourier transformed infrared（FTIR）

megger

and the surface potential measurement system. The test results show that the SiO

2

-like film consisting of Si—O—Si and Si—OH groups is deposited on epoxy resin

when the treatment time exceeds 5 s and its thickness can reach 219 nm. After the deposition

the water contact angle will decrease significantly

the surface and volume conductivity will increase by two orders of magnitude

and the relative permittivity will decrease significantly. According to the three-dimensional distribution of surface potential

the initial accumulation of surface charge on epoxy resin can be suppressed and the process of dissipation is accelerated after the deposition

because the SiO

2

-like film depositing on epoxy resin will reduce the depth of charge traps in the surface layer and suppressed the accumulation of surface charge.