YU Menghan, YANG Lanjun, LIN Tianyu, et al. Insulation Properties of Polyimide Film Laminated Structures Under Repeated Nanosecond Pulse Voltage[J]. 2021, 47(2): 695-704.
YU Menghan, YANG Lanjun, LIN Tianyu, et al. Insulation Properties of Polyimide Film Laminated Structures Under Repeated Nanosecond Pulse Voltage[J]. 2021, 47(2): 695-704.DOI:
In order to improve the insulation performance of insulation structure in the pulse power technology and to prolong the service life of equipment
in this paper
the insulation properties of multilayer insulating film laminates under repetitive nanosecond pulse voltage are studied. The short-time breakdown field strengths and the long-time tolerance pulse number of polyimide monolayers and multilayers with different thicknesses and lamination numbers are compared on the conditions that the rising edge time is 115 ns
the pulse width is 225 ns
and the repetition rate is 1 kHz. A single-factor life model of electrical aging within 15 million repetitions of nanosecond pulse voltage is established. Studies have shown that the laminated structure is beneficial to increasing the dielectric strength of the polyimide. The short-time breakdown field strengths are increased by up to 45.44% because the laminated structure reduces the thickness of the single layer and the breakdown field strength of the single layer increases with decreasing thickness. The number of withstand pulses is also increased. The more the number of layers is
the higher the fast breakdown field strength is and the more the number of withstand pulses is. The number of withstand pulses and the field strength satisfy the exponential relationship
which provides a basis for field strength selection and insulation structure design.