CHU Haijing, LIU Feng, ZHUANG Yue, et al. Influence of H2O Addition on Discharge Characteristics of Nanosecond Pulsed Ar Dielectric Barrier Discharge[J]. 2021, 47(3): 885-893.
CHU Haijing, LIU Feng, ZHUANG Yue, et al. Influence of H2O Addition on Discharge Characteristics of Nanosecond Pulsed Ar Dielectric Barrier Discharge[J]. 2021, 47(3): 885-893.DOI:
水蒸气添加对纳秒脉冲激励氩气DBD放电特性的影响
摘要
为了制备高能效、高活性且均匀稳定的大气压等离子体源
利用纳秒脉冲电源驱动氩气介质阻挡放电(dielectricbarrierdischarge
DBD)
并添加H2O增强等离子体活性。通过电学及光学诊断方法
系统分析研究了H2O体积分数对放电特性的影响规律
并利用图像灰度标准差方法和等效电路模型方法
定量计算了放电均匀性和放电微观参量。结果表明
纳秒脉冲激励氩气DBD中H2O体积分数较低(0%~0.2%)时具有较好均匀性
当H2O体积分数升高后
其吸附电子引起空间电场畸变
产生明亮放电细丝导致放电均匀性降低
过量H2O添加会使放电熄灭;由于添加少量H2O可促进等离子体中电离过程
传输电荷、放电平均功率及能量效率随着H2O体积分数增加而增加
并在H2O体积分数为0.1%时达到极大值
之后随着H2O体积分数增加而减少。通过OH和Ar激发态粒子发射光谱强度表征等离子体活性
发现当H2O体积分数达到0.1%时
OH和Ar谱线强度达到最大
Ar激发态粒子发射光谱强度比值表明电子能量随着H2O体积分数增加而升高
在H2O体积分数为0.1%时达到最大值
之后降低。
Abstract
To generate energy-efficient
reactive
homogeneous
and stable atmospheric pressure plasma sources
Ar dielectric barrier discharge(DBD) was excited by nanosecond pulsed power supply
and H2 O was added to enhance plasma reactivity. The discharge characteristics of the nanosecond pulsed Ar DBD with H2 O addition were investigated by electrical and optical diagnoses. The discharge uniformity was quantitatively calculated by the Gray Value Standard Deviation method
and the electrical parameters were studied by an equivalent electrical model. The results show that the ns-pulsed Ar DBD with 0%~0.2% H2 O content is in a uniform state. When the H2 O content is increased further
the added H2 O absorbs electrons and distorts the space electric field
resulting in bright filaments in space and the decrease of discharge uniformity. And the excessive H2 O will render the discharge to be extinguished. Since the addition of a small amount of H2 O can promote the Penning ionization process in the plasma
the transported charges
average discharge power and energy efficiency increase with the increase of H2 O content first
reach a maximum value at 0.1% H2 O content
and finally decrease with the increase of H2 O content. The plasma reactivity is characterized by the emission spectrum intensities of OH and Ar lines. It is found that
at 0.1% H2 O content
the intensities of OH and Ar lines reach the maximum values. The ratio of emission intensities of Ar lines indicates that the electron energy increases with the increase of H2 O content