欧阳帆, 吴淑群, 刘旭晖, 郭玥, 张潮海. 管内氦等离子体的电场诊断与传播过程研究[J]. 中国电机工程学报, 2021, 41(17): 6116-6126. DOI: 10.13334/j.0258-8013.pcsee.201978
引用本文: 欧阳帆, 吴淑群, 刘旭晖, 郭玥, 张潮海. 管内氦等离子体的电场诊断与传播过程研究[J]. 中国电机工程学报, 2021, 41(17): 6116-6126. DOI: 10.13334/j.0258-8013.pcsee.201978
OUYANG Fan, WU Shuqun, LIU Xuhui, GUO Yue, ZHANG Chaohai. Study on the Electric Field Measurement and Propagation of Helium Plasma in the Tube[J]. Proceedings of the CSEE, 2021, 41(17): 6116-6126. DOI: 10.13334/j.0258-8013.pcsee.201978
Citation: OUYANG Fan, WU Shuqun, LIU Xuhui, GUO Yue, ZHANG Chaohai. Study on the Electric Field Measurement and Propagation of Helium Plasma in the Tube[J]. Proceedings of the CSEE, 2021, 41(17): 6116-6126. DOI: 10.13334/j.0258-8013.pcsee.201978

管内氦等离子体的电场诊断与传播过程研究

Study on the Electric Field Measurement and Propagation of Helium Plasma in the Tube

  • 摘要: 依据氦谱线斯塔克分裂效应测量等离子体中电场强度的基本原理,以管内等离子体为研究对象,采用高压脉冲放电与辐射光谱仪系统同步,获得纳秒动态传播过程中等离子体子弹的电场强度。进一步将该方法应用于对比研究脉冲上升沿和脉冲下降沿放电时管内氦气等离子体的电场分布与传播过程。发现脉冲上升沿放电中等离子体的电场强度高达15.1 kV/cm(距离针尖15 mm处),明显高于脉冲下降沿放电的电场强度。然而,相比于脉冲上升沿放电,脉冲下降沿放电的等离子体传播速度更快。结合等离子体仿真分析发现,高密度的种子电子是造成脉冲下降沿放电等离子体传播速度更快的重要原因。

     

    Abstract: Based on the Stark splitting effect of helium line, the electric field strength of the atmospheric-pressure helium plasma inside a capillary was measured. By precisely synchronizing the trigging signals of the pulsed power system and the spectrometer system, the dynamics of the helium plasma inside the capillary during the discharges at the rising edge and falling edge of the voltage pulse were investigated via electric field measurement. It was found that the electric field strength during the discharge at the rising edge of voltage pulse was about 15.1 kV/cm at the position of 15 mm away from the needle tip, which was much higher than the electric field strength during the discharge at the falling edge of voltage pulse. However, the dynamics of the plasma propagation showed that the propagating velocity of the plasma for the discharge at the falling edge of voltage pulse was greater than that for the discharge at the rising edge of the voltage pulse. Detailed analysis revealed that the high seed electron density inside the discharge channel played a significant role in the plasma propagation during the discharge at the falling edge of voltage pulse.

     

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