向志辉, 郑宇, 任书波, 郝东昕, 颜湘莲, 董利, 周文俊. 六氟-2-丁炔及其与N2混合的电离与击穿特性[J]. 中国电机工程学报, 2025, 45(10): 4067-4076. DOI: 10.13334/j.0258-8013.pcsee.240084
引用本文: 向志辉, 郑宇, 任书波, 郝东昕, 颜湘莲, 董利, 周文俊. 六氟-2-丁炔及其与N2混合的电离与击穿特性[J]. 中国电机工程学报, 2025, 45(10): 4067-4076. DOI: 10.13334/j.0258-8013.pcsee.240084
XIANG Zhihui, ZHENG Yu, REN Shubo, HAO Dongxin, YAN Xianglian, DONG Li, ZHOU Wenjun. Ionization and Breakdown Characteristics of Hexafluoro-2-butyne and Its Mixture With N2[J]. Proceedings of the CSEE, 2025, 45(10): 4067-4076. DOI: 10.13334/j.0258-8013.pcsee.240084
Citation: XIANG Zhihui, ZHENG Yu, REN Shubo, HAO Dongxin, YAN Xianglian, DONG Li, ZHOU Wenjun. Ionization and Breakdown Characteristics of Hexafluoro-2-butyne and Its Mixture With N2[J]. Proceedings of the CSEE, 2025, 45(10): 4067-4076. DOI: 10.13334/j.0258-8013.pcsee.240084

六氟-2-丁炔及其与N2混合的电离与击穿特性

Ionization and Breakdown Characteristics of Hexafluoro-2-butyne and Its Mixture With N2

  • 摘要: 为评估六氟-2-丁炔(分子式C4F6)替代SF6气体应用于气体绝缘电力设备的可行性,该文主要研究C4F6纯气及C4F6/N2混合气体的电离和击穿特性。通过稳态汤逊(steady- state Townsend,SST)试验测量C4F6及C4F6/N2混合气体在200~800 Td (1Td=1×10−21 V⋅m2)范围的约化电离系数、约化吸附系数和临界约化场强(E/N)lim,并开展工频击穿试验评估其在可能的气压和比例参数下的绝缘性能及稳定性。结果表明:C4F6气体的(E/N)lim为697.7 Td,达到SF6气体的1.96倍;C4F6/N2混气的(E/N)lim随C4F6摩尔占比的增加呈线性增长,说明二者之间无协同效应;34.0%C4F6/66%N2混气的(E/N)lim与SF6相当。0.5 MPa下25%C4F6/75%N2的绝缘强度相当于同等压力下SF6的0.89倍。但C4F6/N2混合气体在击穿试验后电极表面生成大量固体积碳,表明C4F6气体稳定性较差。综合考虑绝缘性能和稳定性,C4F6及其混气难以作为绝缘介质应用于气体绝缘电气设备。

     

    Abstract: To evaluate the feasibility of using hexafluoro- 2-butyne (C4F6) as a substitute for SF6 gas in gas insulated power equipment, the ionization and breakdown characteristics of C4F6 pure gas and C4F6/N2 mixtures are studied. The reduced ionization coefficient, reduced attachment coefficient, and critical reduced field strength (E/N)lim of C4F6 and C4F6/N2 mixtures in the range of 200 to 800 Td (1 Td=10−21 V⋅m2) are measured through steady-state Townsend(SST) test, and their insulation performance and stability are evaluated through breakdown discharge test under power frequency voltages. The results show that the (E/N)lim of C4F6 gas is 697.7 Td, which is 1.96 times that of SF6. The (E/N)lim of C4F6/N2 mixture shows a linear growth pattern with the increase of C4F6 molar ratio, and there is no synergistic effect between C4F6 and N2. The (E/N)lim value of 34.0% C4F6/66% N2 mixture is equivalent to SF6. The insulation strength of 25% C4F6/75% N2 under 0.5 MPa is 0.89 compared to SF6 under the same pressure. After the breakdown test, a large number of solid decomposition products are generated on the electrode surface, indicating poor stability of C4F6 gas. Taking into account insulation performance and stability, C4F6 and its mixture are difficult to be applied as insulation media in gas insulated equipment.

     

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