Abstract: The wafer stage carrying silicon for image exposure in the lithography machine is a typical multi-input multi-output (MIMO) ultra-precision motion system. MIMO feedforward control technology is the critical link to suppress coupling errors of each degree of freedom. For the dual-stroke wafer stage with a short-stroke stage (SS) and a long-stroke stage (LoS), an MIMO feedforward strategy based on the master-slave control architecture is proposed. The feedforward adopts a linear parameterization structure and uses the differential unit as the basis function to convert the controller parameter tuning problem into a convex optimization problem. Furthermore, the global optimal parameter tuning method and the unbiased gradient estimation are given. Through multi-die exposure trajectory tracking experiments, the rapid convergence performance of the proposed parameter tuning method is verified. Experimental results demonstrate that the proposed method can effectively reduce the coupling trajectory tracking errors of SS and the relative errors between SS and LoS.