魏晓光, 聂瑞芬, 金锐, 王耀华, 李立, 田宝华, 王松华. 质子注入缓冲层结构的高压FS-IGBT动态坚固性研究[J]. 中国电机工程学报, 2024, 44(5): 1924-1931. DOI: 10.13334/j.0258-8013.pcsee.223138
引用本文: 魏晓光, 聂瑞芬, 金锐, 王耀华, 李立, 田宝华, 王松华. 质子注入缓冲层结构的高压FS-IGBT动态坚固性研究[J]. 中国电机工程学报, 2024, 44(5): 1924-1931. DOI: 10.13334/j.0258-8013.pcsee.223138
WEI Xiaoguang, NIE Ruifen, JIN Rui, WANG Yaohua, LI Li, TIAN Baohua, WANG Songhua. Investigation on Dynamic Robustness of High Voltage FS-IGBT With Multiple Proton Injection Buffers Layer[J]. Proceedings of the CSEE, 2024, 44(5): 1924-1931. DOI: 10.13334/j.0258-8013.pcsee.223138
Citation: WEI Xiaoguang, NIE Ruifen, JIN Rui, WANG Yaohua, LI Li, TIAN Baohua, WANG Songhua. Investigation on Dynamic Robustness of High Voltage FS-IGBT With Multiple Proton Injection Buffers Layer[J]. Proceedings of the CSEE, 2024, 44(5): 1924-1931. DOI: 10.13334/j.0258-8013.pcsee.223138

质子注入缓冲层结构的高压FS-IGBT动态坚固性研究

Investigation on Dynamic Robustness of High Voltage FS-IGBT With Multiple Proton Injection Buffers Layer

  • 摘要: 具有多重质子注入(multiple proton injection,MPI)缓冲层结构的FS-IGBT,相比传统磷注入缓冲层结构的同类型器件,其动态坚固性发生了改变。通过对MPI缓冲层结构的FS-IGBT的短路特性研究发现,MPI缓冲层的峰数越多,抗短路热失效能力越强,但是峰数太多,可能会引起IGBT在短路时的栅极电压振荡,造成器件失效。这与IGBT在短路大电流下的Kirk效应有关。Kirk效应造成短路时IGBT栅电极下电场降低,电子运动速率减小,进而栅电极下累积的电子造成栅极输入电容的改变,引起栅电压振荡。此外,实验发现,MPI缓冲层峰的氢相关施主(hydrogen-related donors,HDs)浓度不仅与注入剂量和激活温度有关,还与注入次数有关,具体表现为注入次数多,辐射损伤多,HDs浓度越高。文中研究不同MPI缓冲层结构的IGBT关断坚固性。

     

    Abstract: The dynamic robustness of FS-IGBT with multiple proton injection buffers (MPI) is changed compared with the same type of devices which has traditional phosphorus injection buffers. By studying the short-circuit characteristics of FS-IGBT with MPI buffer layer, it is found that the higher the number of peaks in MPI buffer layer, the stronger the resistance to short-circuit thermal failure. However, too many peaks may cause the gate voltage oscillation of IGBT during short-circuit, resulting in device failure. This is related to Kirk effect of IGBT under large short circuit current. Kirk effect results in the reduction of the electric field under the IGBT gate electrode and the decrease of the electron velocity, and then the accumulated electrons under the gate electrode cause the change of the gate input capacitance, leading to gate voltage oscillation. In addition, it is found that the hydrogen-related donors (HDs) concentration of MPI buffer layer peak is not only related to the injection dose and activation temperature, but also related to the injection times. The more the injection times, the higher the concentration of HDs caused by radiation damage. The turn-off robustness of IGBTs with different MPI buffer structures is also studied.

     

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