不同雪崩冲击模式下SiC MOSFET的失效机理
Failure Mechanism of SiC MOSFET Under Different Avalanche Shocks Mode
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摘要: 在高开关速度di/dt和寄生电感的耦合下,SiC MOSFET器件极易进入雪崩工作模式。针对现有单一实验失效分析难以揭示不同雪崩冲击模式可能引起不同失效模式的问题,提出在单次和重复雪崩冲击下SiC MOSFET器件失效机理的实验与仿真研究。首先,搭建SiC MOSFET非钳位电感(unclamped inductive switching,UIS)雪崩实验平台及元胞级仿真模型。其次,基于单次脉冲雪崩冲击实验建立SiC MOSFET对应失效模型,获取单次脉冲下失效演化中元胞电热分布规律。最后,基于重复雪崩冲击失效实验,建立SiC MOSFET对应失效演化模型,仿真性能退化特征参数,获取重复雪崩冲击下失效演化过程的电场分布规律。实验和仿真表明,单次脉冲雪崩冲击下寄生BJT闩锁造成SiC MOSFET器件失效;而氧化层捕获空穴形成氧化层固定电荷会导致器件后期阈值电压降低,引起重复雪崩冲击下器件失效。Abstract: SiC MOSFET power electronic device is very likely to be driven into avalanche mode with the coupling of high di/dt and parasitic inductance. In view of existing ordinary experimental analysis, which is difficult to reveal the problem that different avalanche shock mode could lead to different failure mechanism, the failure mechanism of SiC MOSFET under single and repetitive avalanche shocks was investigated. Firstly, unclamped inductive switching(UIS) experimental bench for avalanche test was constructed, as well as the simulation model in cell level. Secondly, on the basis of single pulse avalanche shock experiment, corresponding failure model was built, and the distribution of thermal-electrical property during the process of failure evolution was analyzed by simulation model with single shock. Finally, the failure evolutionary model was constructed based on experiment of repetitive avalanche shock, and corresponding degradation parameter was studied with the help of repetitive avalanche failure model, which is used to investigate the distribution regularity of electric field in SiC MOSFET cell under repetitive avalanche shock. The experimental and simulation results show that parasitic BJT lunch-up leads to the failure of single pulse avalanche shocks. While, the increase of fixed charge in oxide by trapping holes contributes to decrease of threshold voltage of SiC MOSFET and its repetitive avalanche failure.