Abstract: Aiming at the energy loss caused by light reflection on the polysilicon surface,research on the anti-reflection microtexture of the polysilicon surface based on the cone-top array texture was carried out. First,through differential finite element analysis,the influence of the height of the suede on the reflectivity was simulated. The results show that the surface reflectance reaches the lowest value when the suede height is 30 μm. Secondly,periodic domed cone-shaped array textures with different heights were prepared on the surface of the silicon wafer by UV nanosecond laser and the manufacturing process of the suede was optimized. Also the reflectance of different suede was tested and the open circuit voltage and short circuit current were simulated. The results show that when the height of the suede texture is 30.24 μm,the anti-reflection effect is the best. The average reflectance of the surface is 4.03%,and its conversion efficiency is 18.81%.