Abstract: Tungsten thin films were deposited on three different substrates at different substrate temperature using PDC magnetron sputtering process. The coatings were measured and characterized to obtain their IR reflectance,film resistivity,crystal structure and their preferred orientation,and surface morphology. As the results, the crystal structure of the films is the completely thermodynamically stable BBC α-W with110preferred orientation when the film is deposited at 300 ℃ substrate temperature. Meanwhile,the resistivity is 22 μΩ·cm and the emittance is lower than 0.07（500 ℃）. Through the method of substrate heated in film deposition process,the metastable phase β-W is completely transformed into the stable phase BBC α-W at a small film thickness of 150 nm,which can be potentially applied to large area coating technology for IR reflective layer of the mid-and high-temperature solar selective absorbing coatings. The thermal stability test for the Tungsten film with above mentioned two different crystal structure under 400 ℃ in air further confirmed that α-W film significantly improves the thermal stability of the whole solar absorbing coatings.