Abstract: Polydimethylsiloxane（PDMS）film has attracted extensive attention in improving the performance of solar cells due to its low preparation cost,simple process and superhydrophobic properties. This paper introduces a micro-nano-layered array structure double anti-reflection film based on PDMS material. The microarray structure template pattern is photolithographically formed by a conventional laser direct writing machine. The microarray structure is replicated onto the PDMS film,and the PDMS film is subjected to plasma surface modification to form a nano-pleated structure on the micro-array structure. Thus,a micro-nano-layered array structure double anti-reflection film is prepared at low cost. The test results show that the prepared micro-nano layered array of PDMS anti-reflection film can increase the relative efficiency of high-efficiency polycrystalline silicon cells by more than 4.7%,decrease the relative reflectivity by 30.3%,and the water contact angle of the surface of the anti-reflection film is increased by more than 30°.