胡林娜, 宋志成, 何亮, 郭永刚, 屈小勇, 马继奎. 基于GR噪声的太阳电池缺陷表征研究[J]. 太阳能学报, 2021, 42(3): 319-322. DOI: 10.19912/j.0254-0096.tynxb.2018-1025
引用本文: 胡林娜, 宋志成, 何亮, 郭永刚, 屈小勇, 马继奎. 基于GR噪声的太阳电池缺陷表征研究[J]. 太阳能学报, 2021, 42(3): 319-322. DOI: 10.19912/j.0254-0096.tynxb.2018-1025
Hu Linna, Song Zhicheng, He Liang, Guo Yonggang, Qu Xiaoyong, Ma Jikui. RESEARCH ON DEFECT CHARACTERIZATION OF SOLAR CELL BASED ON GR NOISE[J]. Acta Energiae Solaris Sinica, 2021, 42(3): 319-322. DOI: 10.19912/j.0254-0096.tynxb.2018-1025
Citation: Hu Linna, Song Zhicheng, He Liang, Guo Yonggang, Qu Xiaoyong, Ma Jikui. RESEARCH ON DEFECT CHARACTERIZATION OF SOLAR CELL BASED ON GR NOISE[J]. Acta Energiae Solaris Sinica, 2021, 42(3): 319-322. DOI: 10.19912/j.0254-0096.tynxb.2018-1025

基于GR噪声的太阳电池缺陷表征研究

RESEARCH ON DEFECT CHARACTERIZATION OF SOLAR CELL BASED ON GR NOISE

  • 摘要: 采用无损的噪声检测手段筛选出呈现GR噪声和1/f噪声的电池,然后进行GR噪声电池和1/f噪声电池电学性能的对比,分析表明呈现GR噪声电池的电学性能明显弱于1/f噪声电池。最后对GR噪声的电池进行不同电压下的测试,通过提取GR噪声转折频率和电压的关系显示GR噪声源对电压有敏感响应。同时结合非晶硅电池的p-i-n结结构证实GR噪声源位于耗尽层的结论。

     

    Abstract: Serious recombination effects would be enforced in the process of electrode collection of carriers due to deep-level defects act as recombination centers in solar cells,resulting in a significant reduction of short-circuit current,which directly affects the performance of photovoltaic products. Therefore,the existence of deep-level defects must be strictly detected in the production process of solar cells. However,based on the limitations of conventional characterization methods,the solar cells with GR noise and 1/f noise was firstly studied by means of nondestructive noise detection,and then the electrical performance of GR noise and 1/f noise solar cells were compared. The analysis showed that the electrical performance of GR noise solar cells is significantly weaker than that of 1/f noise.Finally,the solar cells with GR noise was tested under different voltages. According to the relationship between GR noise turning frequency and voltage is extracted to show that GR noise source is sensitive to voltage. At the same time,the conclusion that GR noise source is located in depletion layer is confirmed by combining with PIN junction structure of amorphous silicon cell.

     

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