Abstract: In recent years,with the continuous and rapid development of the PV industry,the n-type TOPCon solar cells technology route has been recognized by the market,and production capacity has rapidly expanded.Boron diffusion equipment,as one of the core process equipment for TOPCon solar cells,has received great attention from the market,the temperature control system plays a decisive role in the production process of boron diffusion equipment. This paper compares the square resistance uniformity of silicon wafers obtained by using horizontal and vertical insertion methods in the traditional furnace during the practical application of boron diffusion equipment. It is found that the horizontal insertion method has the problem of high square resistance of the middle layer silicon wafers within the boat,and the square resistance uniformity does not meet the technical requirements. A new type of divisional furnace has been designed,and three types of temperature control system schemes have been proposed. Through process verification,a scheme that meets the technical requirements has been obtained. The research results show that when the divisional furnace is combined with the horizontal insertion method,the temperature control system scheme 3 can meet the technical requirements.