文韬, 向念文, 章程, 沙致远, 邵涛. 高压放电等离子体研究现状及发展趋势[J]. 高电压技术, 2023, 49(8): 3226-3239. DOI: 10.13336/j.1003-6520.hve.20231062
引用本文: 文韬, 向念文, 章程, 沙致远, 邵涛. 高压放电等离子体研究现状及发展趋势[J]. 高电压技术, 2023, 49(8): 3226-3239. DOI: 10.13336/j.1003-6520.hve.20231062
WEN Tao, XIANG Nianwen, ZHANG Cheng, SHA Zhiyuan, SHAO Tao. Research Status and Development Trend of High Voltage Discharge Plasma[J]. High Voltage Engineering, 2023, 49(8): 3226-3239. DOI: 10.13336/j.1003-6520.hve.20231062
Citation: WEN Tao, XIANG Nianwen, ZHANG Cheng, SHA Zhiyuan, SHAO Tao. Research Status and Development Trend of High Voltage Discharge Plasma[J]. High Voltage Engineering, 2023, 49(8): 3226-3239. DOI: 10.13336/j.1003-6520.hve.20231062

高压放电等离子体研究现状及发展趋势

Research Status and Development Trend of High Voltage Discharge Plasma

  • 摘要: 文中概述了2022年全国高电压与放电等离子体学术会议。根据会议的学术报告,并结合近年来高压放电等离子体领域的研究热点,从特性机理研究和应用研究两方面总结和分析了高压放电等离子体的研究现状和发展趋势。其中,特性机理研究主要围绕等离子体激励源及其特性研究、等离子体诊断和等离子体数值仿真等3个方面进行展开,应用研究则主要集中在材料改性、能源转化、环境治理、生物医学和航空航天等领域。从会议相关内容来看,国内对于高压放电等离子体的研究业已取得了良好进展,特性机理研究和应用研究间彼此相互渗透、共同发展。在未来的研究中,需重点突破时空多尺度问题、等离子体剂量特性、等离子体参数精细化调控技术和面向不同工质的均匀稳定放电产生技术等共性科学问题;同时针对高压放电等离子体共性关键科学问题和特定领域应用研究开展重点攻关,建立面向实际应用的等离子体工艺技术。伴随着高压放电等离子体技术与其他研究领域间的联系日趋紧密,相信未来将有更高水平的优秀科研成果不断涌现。

     

    Abstract: Based on the academic presentations at conferences and recent research trends in the field of high voltage discharge plasma, the research status and development trends of high voltage discharge plasma are summarized and analyzed from the perspectives of characteristic mechanism research and application research. In terms of characteristic mechanism research, the focus is mainly on plasma excitation sources and their characteristics, plasma diagnostics, and plasma numerical simulations. Application research mainly concentrates on material modification, energy conversion, environmental governance, biomedical applications, and aerospace. Based on the content of conferences, significant progress has been made in the research of high voltage discharge plasma in China, and there is a mutual penetration and collaborative development between characteristic mechanism research and application research. In future research, it is necessary to focus on key scientific issues that are common to the field, such as addressing space-time multiscale problems, plasma dose characteristics, fine control techniques for plasma parameters, and the development of uniform and stable discharge generation techniques for different working media. Simultaneously, targeted efforts should be made to address key scientific issues related to high voltage discharge plasma and conduct focused research on specific applications in various domains, with the aim of establishing plasma processing technologies that are applicable in practical settings. As the connection between high voltage discharge plasma technology and other research fields becomes increasingly close, it is believed that there will be a continuous emergence of outstanding scientific research achievements at a higher level.

     

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