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基于染料表面改性的GeSe薄膜光电性能研究
更新时间:2026-01-08
    • 基于染料表面改性的GeSe薄膜光电性能研究

    • Vol. 46, Issue 12, Pages: 161-167(2025)
    • DOI:doi:10.19912/j.0254-0096.tynxb.2024-1454    

      CLC: TM914
    • Published Online:07 January 2026,

      Published:2025

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  • 张文艺, 吴海峰, 韩莹键, et al. 基于染料表面改性的GeSe薄膜光电性能研究[J]. 2025, 46(12): 161-167. DOI: doi:10.19912/j.0254-0096.tynxb.2024-1454.

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