AgTa红外反射薄膜的稳定性研究

杨登; 曹鸿涛; 高俊华

doi:10.19912/j.0254-0096.tynxb.2025-0112

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AgTa红外反射薄膜的稳定性研究

更新时间：2026-07-22

- AgTa红外反射薄膜的稳定性研究
- Vol. 47, Issue 6, Pages: 792-798(2026)
- 作者机构：
- 作者简介：
- 基金信息：
- DOI：10.19912/j.0254-0096.tynxb.2025-0112
  CLC： TK511
- Online First：08 July 2026，
  
  Published：2026
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杨登, 曹鸿涛, 高俊华. AgTa红外反射薄膜的稳定性研究[J]. 2026, 47(6): 792-798.
DOI：

杨登, 曹鸿涛, 高俊华. AgTa红外反射薄膜的稳定性研究[J]. 2026, 47(6): 792-798. DOI： 10.19912/j.0254-0096.tynxb.2025-0112.

摘要

为采用微合金化策略

在银（Ag）膜中掺杂钽（Ta）并对其反射光谱、晶体结构和表面形貌进行表征。结果表明

在合适的Ta掺杂浓度下

AgTa薄膜经600 ℃真空退火后

红外反射率可达95%以上

且保持优异的微结构稳定性。

Abstract

Conventional infrared reflective layers often struggle with thermal instability at high temperatures or insufficient infrared reflectivity

limiting their practical applications. In this study

we employed a microalloying approach to enhance film performance by incorporating tantalum （Ta） into silver （Ag） films via magnetron sputtering. The reflective spectra

crystal structure

and surface morphology of the films were systematically analyzed. The results indicate that Ta doping effectively inhibites the preferred growth of the Ag（111） crystal plane. Furthermore

high-vacuum thermal stability tests at 600 ℃ confirm that the AgTa infrared reflective coatings retain excellent optical and structural stability

even under elevated temperatures.

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Keywords

references

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