High-purity polysilicon is the main raw material for solar photovoltaics and semiconductors
and its preparation methods mainly include the modified Siemens process and the silane fluidized bed reactor (FBR) process. Due to the specificity of the processes
the silicon fines content in granular polysilicon produced by the silane FBR process is higher than that of rod-shaped silicon produced by the modified Siemens process
which can lead to severe impacts on the thermal field and equipment during the subsequent producing of the Czochralski monocrystalline silicon and also affect the quality of the monocrystalline silicon. Currently
research on dedusting of granular silicon is still in its infancy
and the dust removal methods commonly used in the market are typically physical separation methods
but the effectiveness is not significant. This paper analyzes the causes of fines formation in the silane FBR process
elaborates on the impact of silicon fines on Czochralski monocrystalline silicon and corresponding control measures
and summarizes the current research status of dedusting of granular silicon. Finally
suggestions for future research and development related to the turbidity of granular silicon are proposed.
LAI S, DUDUKOVIC M P, RAMACHANDRAN P A.Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane[J]. Chemical engineering science, 1986, 41(4): 633-641.
O'MARA W, HERRING R B, HUNT L P. Handbook of semiconductor silicon technology[M]. Johannesburg: Crest Publishing House, 2007.
CHEN H, JIE Y, YAN H, et al.Numerical simulation and validation of reaction mechanism for the Siemens process in silicon production[J]. Journal of crystal growth, 2023, 618: 127314.
HSU G, HOGLE R, ROHATGI N, et al.Fines in fluidized bed silane pyrolysis[J]. Journal of the Electrochemical Society, 1984, 131(3): 660-663.
MURTHY T U M S, MIYAMOTO N, SHIMBO M, et al. Gas-phase nucleation during the thermal decomposition of silane in hydrogen[J]. Journal of crystal growth, 1976, 33(1): 1-7.
KIMURA T, KOJIMA T. Numerical model of a fluidized bed reactor for polycrystalline silicon production-estimation of CVD and fines formation[J]. Le journal de physique Ⅳ, 1991, 2(C2): C2-103-C2-110.
HEADY R B, CAHN J W.Experimental test of classical nucleation theory in a liquid-liquid miscibility gap system[J]. The journal of chemical physics, 1973, 58(3): 896-910.
PRAKASH A, BAPAT A P, ZACHARIAH M R.A simple numerical algorithm and software for solution of nucleation, surface growth, and coagulation problems[J]. Aerosol science and technology, 2003, 37(11): 892-898.
KRUIS F E, SCHOONMAN J, SCARLETT B.Homogeneous nucleation of silicon[J]. Journal of aerosol science, 1994, 25(7): 1291-1304.
BREILAND W G, COLTRIN M E, HO P.Comparisons between a gas‐phase model of silane chemical vapor deposition and laser‐diagnostic measurements[J]. Journal of applied physics, 1986, 59(9): 3267-3273.
HO P, COLTRIN M E, BREILAND W G.Laser-induced fluorescence measurements and kinetic analysis of Si atom formation in a rotating disk chemical vapor deposition reactor[J]. The journal of physical chemistry, 1994, 98(40): 10138-10147.
YUUKI A, MATSUI Y, TACHIBANA K.A numerical study on gaseous reactions in silane pyrolysis[J]. Japanese journal of applied physics, 1987, 26(5R): 747.
GIUNTA C J, MCCURDY R J, CHAPPLE-SOKOL J D, et al. Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane[J]. Journal of applied physics, 1990, 67(2): 1062-1075.
ONISCHUK A A, STRUNIN V P, SAMOILOVA R I, et al.Chemical composition and bond structure of aerosol particles of amorphous hydrogenated silicon forming from thermal decomposition of silane[J]. Journal of aerosol science, 1997, 28(8): 1425-1441.
KREMER D M, DAVIS R W, MOORE E F, et al.A numerical investigation of the effects of gas-phase particle formation on silicon film deposition from silane[J]. Journal of crystal growth, 2003, 247(3/4): 333-356.
PURNELL J H, WALSH R.The pyrolysis of monosilane[J]. Proceedings of the royal society of London series a mathematical and physical sciences, 1966, 293(1435): 543-561.