Research Progress of Silicon Nitride Ceramic Ball Grinding and Polishing Technology

Xiao Xiao-lan; Yan Qiu-sheng; Lin Hua-tai; Jiao Jing-hao; Liu Jie

doi:10.12052/gdutxb.180075

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Research Progress of Silicon Nitride Ceramic Ball Grinding and Polishing Technology

更新时间：2026-05-27

- Research Progress of Silicon Nitride Ceramic Ball Grinding and Polishing Technology
- Vol. 35, Issue 6, Pages: 18-23, 30(2018)
- 作者机构：
  
  1. 广东工业大学　机电工程学院,广东,广州,510006
  2. 广州番禺职业技术学院　机电工程学院,广东,广州,511483
- 作者简介：
- 基金信息：
- DOI：10.12052/gdutxb.180075
  CLC： TH709
- Online First：23 November 2018，
  
  Published：2018
- 稿件说明：
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肖晓兰, 阎秋生, 林华泰, 焦竞豪, 刘杰. 氮化硅陶瓷球研磨抛光技术研究进展[J]. 广东工业大学学报, 2018, 35(6): 18-23, 30.

Xiao Xiao-lan, Yan Qiu-sheng, Lin Hua-tai, et al. Research Progress of Silicon Nitride Ceramic Ball Grinding and Polishing Technology[J]. 2018, 35(6): 18-23, 30.
肖晓兰, 阎秋生, 林华泰, 焦竞豪, 刘杰. 氮化硅陶瓷球研磨抛光技术研究进展[J]. 广东工业大学学报, 2018, 35(6): 18-23, 30. DOI： 10.12052/gdutxb.180075.

Xiao Xiao-lan, Yan Qiu-sheng, Lin Hua-tai, et al. Research Progress of Silicon Nitride Ceramic Ball Grinding and Polishing Technology[J]. 2018, 35(6): 18-23, 30. DOI： 10.12052/gdutxb.180075.

摘要

氮化硅陶瓷球是重大装备中轴承的关键基础元件

球体的超精密研磨抛光质量是影响轴承性能与寿命的重要因素. 本文从加工方法的角度

总结了陶瓷球研磨抛光技术的研究进展

对不同的陶瓷球超精密复合抛光方法进行了比较分析

并提出了一种新型抛光方法

即集群磁流变抛光陶瓷球的方法. 该方法初步测试显示

经3 h的抛光

氮化硅陶瓷球的表面粗糙度Ra由50 nm下降到5 nm

球度达到0.11~0.22 μm.

Abstract

Silicon nitride ceramic ball is the key element of bearings in heavy equipment

and the ultra-precision grinding and polishing quality of the balls is an important factor affecting the bearing performance and life. From the angle of the processing method

the research progress of ceramic ball grinding and polishing technology is summarized. The method of ultra-precision compound polishing for different silicon nitride ceramic balls is compared and analyzed. A new method of grinding and polishing

that is

the method of cluster magnetorheological polishing

is put forward. Preliminary tests show that by the method of 3 hours of polishing

silicon nitride ceramic ball surface roughness Ra can reach 5 nm

and sphericity is 0.11 to 0.22 μm.

关键词

Keywords

references

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