Modeling Method of Contact Resistance Based on Fuzzy System

WANG Gang; TAN Shengwu; LIN Shengjun; WANG Zhijun; CHANG Linjing

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Modeling Method of Contact Resistance Based on Fuzzy System

更新时间：2025-12-08

- Modeling Method of Contact Resistance Based on Fuzzy System
- Vol. 43, Issue 3, Pages: 940-945(2017)
- 作者机构：
  
  平高集团有限公司
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published Online：10 March 2017，
  
  Published：2017
- 稿件说明：
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WANG Gang, TAN Shengwu, LIN Shengjun, et al. Modeling Method of Contact Resistance Based on Fuzzy System[J]. 2017, 43(3): 940-945.
DOI：

WANG Gang, TAN Shengwu, LIN Shengjun, et al. Modeling Method of Contact Resistance Based on Fuzzy System[J]. 2017, 43(3): 940-945. DOI：

摘要

接触电阻是衡量电接触可靠性的重要参数。为此针对接触电阻的特点

提出了基于模糊系统的接触电阻建模方法。该方法通过试验得到训练数据与测试数据。将基本蚁群算法与递推最小二乘算法结合形成改进算法。采用训练数据调整模糊系统参数

算法分别为递推最小二乘算法、基本蚁群算法、改进算法。与其他两种算法相比

改进算法的收敛误差减小1倍以上。利用训练数据建立接触电阻的回归分析模型

并通过测试数据对各模型进行测试。改进算法训练模糊系统所得接触电阻模型的测试误差比其他模型减小10%。测试结果说明用改进算法训练模糊系统的方法计算接触电阻是可行的。

Abstract

The contact resistance is important for dependability of electrical contact.We put forward a modeling method based on fuzzy system isfor contact resistance.Training data and testing data are obtained from the experiment.The improved algorithm is developed by combining basic ant colony algorithm and recursive least square algorithm.The parameters of fuzzy system are obtained through the training data

and the training algorithms are the recursive least square algorithm

basic ant colony algorithm

and improved algorithm

respectively.Compared with that of other two algorithms

the convergence error of the improved algorithm decreases more than one time.The model of contact resistance based on regression analysis is also built.Every model is tested by testing data.The dependability of model is verified and the prediction result is compared.Compared with that of other two models

the prediction error of fuzzy system trained by improved algorithm decreases 10%.The results of prediction and comparison show that the fuzzy system trained by improved algorithm is reliable to model contact resistance.

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